Cheolkyu Bok

Patterning process study for 30nm hole

Hyunkyung Shim, Donggyu Yim, Kilyoung Lee, 2011, Advanced Lithography.

The opportunity and challenge of spin coat based nanoimprint lithography

Takuya Kono, Tetsuro Nakasugi, Kei Kobayashi, 2017, Advanced Lithography.

Optimization of BARC process for hyper-NA immersion lithography

Junghyung Lee, Kilyoung Lee, Sungkoo Lee, 2008, SPIE Advanced Lithography.

Comprehensive EUV lithography model

Trey Graves, Stewart Robertson, Donggyu Yim, 2011, Advanced Lithography.