Lee H. Veneklasen

0.25-μm lithography using a 50-kV shaped electron-beam vector scan system

Allan L. Sagle, Mark A. Gesley, Zoilo C. H. Tan, 1995, Advanced Lithography.

Reduction of beam-induced pattern placement errors in MEBES systems

David W. Alexander, Suzanne Weaver, Damon M. Cole, 1999, Photomask Technology.

High-throughput electron-beam lithography with a raster-scanned, variably shaped beam

Volker Boegli, Stephen A. Rishton, Richard L. Lozes, 2001 .

Run-time correction of proximity effects in raster scan pattern generator systems

Volker Boegli, U. Hofmann, Lee H. Veneklasen, 1999 .

Optimizing electron beam lithography writing strategy subject to electron optical, pattern, and resist constraints

Lee H. Veneklasen, L. Veneklasen, 1991 .

Electron-optical optimization for Gaussian, high-current, high-dose columns

Henry Thomas Pearce-Percy, Marian Mankos, Lee H. Veneklasen, 1998 .

Raster shaped beam pattern generation

Volker Boegli, Allan L. Sagle, Stephen A. Rishton, 1999 .

Implementation of real-time proximity effect correction in a raster shaped beam tool

Volker Boegli, Stephen A. Rishton, U. Hofmann, 2000 .