Victor Katsap

3D simulation of flat-cathode electron guns with space charge

Warren K. Waskiewicz, John A. Rouse, Xieqing Zhu, 1999, Optics & Photonics.

Progress on the realization of the electron column modules for SCALPEL high-throughput/alpha electron projection lithography tools

Warren K. Waskiewicz, John A. Rouse, Xieqing Zhu, 2001, SPIE Advanced Lithography.

EBM-8000: EB mask writer for product mask fabrication of 22nm half-pitch generation and beyond

Kenichi Saito, Hiroyoshi Ando, Takashi Kamikubo, 2011, Photomask Technology.

EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond

Kenichi Saito, Hiroyoshi Ando, Takashi Kamikubo, 2014, Photomask Technology.

Modeling of laminar e-beam source for SCALPEL

Warren K. Waskiewicz, Victor Katsap, James Alexander Liddle, 1999, Optics & Photonics.

EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond

Hiroyoshi Ando, Takashi Kamikubo, Jun Yashima, 2014, Photomask and Next Generation Lithography Mask Technology.

New electron optics for mask writer EBM-7000 to challenge hp 32nm generation

Takashi Kamikubo, Munehiro Ogasawara, Shuichi Tamamushi, 2008, Photomask Technology.

Scanning thermionic emission imaging of cathode surfaces

Warren K. Waskiewicz, Victor Katsap, Peter B. Sewell, 1999, Optics & Photonics.

Electron beam mask writer EBM-9500 for logic 7nm node generation

Kenichi Saito, Haruyuki Nomura, Takashi Kamikubo, 2016, Photomask Technology.

In-situ beam metrology in shaped-beam lithography tool

Takashi Kamikubo, Shuichi Tamamushi, Hitoshi Sunaoshi, 2008 .