Koji Nozaki

发表

Overcoat materials for acrylate resists to enhance their resolution

Ei Yano, Isamu Hanyu, Hajime Yamamoto, 2003, SPIE Advanced Lithography.

Alicyclic polymer for ArF and KrF excimer resist based on chemical amplification

Naomichi Abe, Yuko Kaimoto, Koji Nozaki, 1992, Advanced Lithography.

Environmentally stable chemically amplified resist effects of organic salt additives

Ei Yano, Keiji Watanabe, Takahisa Namiki, 1995, Advanced Lithography.

Evaluation of chemically amplified resist based on adamantyl methacrylate for 193-nm lithography

Naomichi Abe, Isamu Hanyu, Makoto Takahashi, 1995, Advanced Lithography.

High-performance resist materials for ArF excimer laser and electron beam lithography

Ei Yano, Koji Nozaki, 2002 .

High-performance EB chemically amplified resists using alicyclic protective groups

Ei Yano, Takahisa Namiki, Junichi Kon, 2000, Advanced Lithography.

Melting behaviors of polyethylene crystals: An application of fast-scan DSC

Akihiko Toda, Ken Taguchi, Koji Nozaki, 2014 .

A NOVEL POLYMER FOR A 193-nm RESIST

Ei Yano, Isamu Hanyu, Keiji Watanabe, 1996 .

Material Innovations for 193-nm Resists

Koji Nozaki, 2010 .

Characteristics of Silicon-Based Negative Resists in ArF Excimer Laser Lithography

Ei Yano, Keiji Watanabe, Takahisa Namiki, 1995 .

Ethanol production from cellulosic materials by genetically engineered Zymomonas mobilis

Kenji Okamoto, Koji Nozaki, Hideshi Yanase, 2005, Biotechnology Letters.

Morphology and Growth of Single Crystals of Isotactic Polypropylene from the Melt

Hiroshi Kajioka, Akihiko Toda, Koji Yamada, 2010 .

A New Single-Layer Resist for 193-nm Lithography

Ei Yano, Keiji Watanabe, Takahisa Namiki, 1996 .

LITHOGRAPHIC CHARACTERISTICS OF ALICYCLIC POLYMER BASED ArF SINGLE LAYER RESISTS

Naomichi Abe, Yuko Kaimoto, Koji Nozaki, 1994 .

Nucleation and Growth in the Solid-Solid Phase Transitions of n-Alkanes

Koji Nozaki, Masamichi Hikosaka, 2001 .

Growth of regularly coiled carbon filaments by Ni catalyzed pyrolysis of acetylene, and their morphology and extension characteristics

Masayuki Kawaguchi, Koji Nozaki, S. Motojima, 1990 .

Molecular Design and Synthesis of 3-Oxocyclohexyl Methacrylate for ArF and KrF Excimer Laser Resist

Naomichi Abe, Yuko Kaimoto, Koji Nozaki, 1994 .

PREPARATION OF COILED CARBON FIBERS BY CATALYTIC PYROLYSIS OF ACETYLENE, AND ITS MORPHOLOGY AND EXTENSION CHARACTERISTICS

Masayuki Kawaguchi, Koji Nozaki, S. Motojima, 1991 .

Impact of 2-Methyl-2-Adamantyl Group Used for 193-nm Single-layer Resist

Ei Yano, Isamu Hanyu, Koji Nozaki, 1996 .

New Protective Groups in Alicyclic Methacrylate Polymers for 193-nm Resists

Ei Yano, Koji Nozaki, 1997 .