Steven Nguyen

X-ray exposures of electrodeposited photoresist for conformal lithography on corrugated surfaces

Frank T. Hartley, Chantal G. Khan Malek, Steven Nguyen, 1998, Advanced Lithography.

DUV synchrotron exposure station at CAMD

Chantal G. Khan Malek, J. Michael Klopf, Volker Saile, 1998, Advanced Lithography.

Prototyping for high-aspect-ratio MEMS by high-energy x-ray lithography using boron-carbide-based masks

Chantal G. Khan Malek, Steven Nguyen, 1999, Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components.