Thomas Kocab

发表

Mechanism studies of scanning electron microscope measurement effects on 193-nm photoresists and the development of improved line-width measurement methods

Mark Neisser, William R. Livesay, Matthew F. Ross, 2001, SPIE Advanced Lithography.

Thermal properties of COMA materials

Ilya L. Rushkin, Ognian N. Dimov, Arturo N. Medina, 2001, SPIE Advanced Lithography.