Sean D. Burns

发表

Dual tone sub-resolution assist features to improve corner rounding

Cheng Chi, Hao Tang, Oseo Park, 2020 .

Recent advances in a molecular level lithography simulation

Lewis W. Flanagin, C. Grant Willson, Sean D. Burns, 2000, Advanced Lithography.

Effect of humidity on deprotection kinetics in chemically amplified resists

Gregory M. Wallraff, William D. Hinsberg, C. Grant Willson, 2002, SPIE Advanced Lithography.

Understanding nonlinear dissolution rates in photoresists

Lewis W. Flanagin, C. Grant Willson, Sean D. Burns, 2001, SPIE Advanced Lithography.

Implications of immersion lithography on 193-nm photoresists

Ryan Deschner, Charles R. Chambers, Sean D. Burns, 2004, SPIE Advanced Lithography.

Graded spin-on organic bottom antireflective coating for high NA lithography

John Arnold, Robert D. Allen, Sean D. Burns, 2008, SPIE Advanced Lithography.

Dissolution behavior of fluoroalcohol-substituted polystyrenes

Brian Osborn, C. Grant Willson, Sean D. Burns, 2001, SPIE Advanced Lithography.

Dark Field Double Dipole Lithography (DDL) for back-end-of-line processes

Stephen Hsu, Jungchul Park, Derren Dunn, 2007, SPIE Advanced Lithography.

Spacer-defined double patterning for 20nm and beyond logic BEOL technology

Harry J. Levinson, Sean D. Burns, Martin Burkhardt, 2011, Advanced Lithography.

Molecular resists based on polyhedral oligomeric silsesquioxanes (POSS)

Hiroshi Ito, Dario L. Goldfarb, Sean D. Burns, 2005, SPIE Advanced Lithography.

Mesoscale simulation of positive tone chemically amplified photoresists

C. Grant Willson, Sean D. Burns, Gerard M. Schmid, 2002, SPIE Advanced Lithography.

Silsesquioxane-based 193 nm bilayer resists: characterization and lithographic evaluation

Hiroshi Ito, Hoa D. Truong, Sean D. Burns, 2005, SPIE Advanced Lithography.

Lithographic qualification of high-transmission mask blank for 10nm node and beyond

Nelson Felix, Richard Wistrom, Yoshifumi Sakamoto, 2016, Advanced Lithography.

Assessment of negative tone development challenges

Alan C. Thomas, Sohan Singh Mehta, Jerome Wandell, 2012, Other Conferences.

Fin formation using graphoepitaxy DSA for FinFET device fabrication

Akiteru Ko, Nelson Felix, Nihar Mohanty, 2015, Advanced Lithography.

Sidewall imaging transfer process with several critical dimensions

Allen H. Gabor, Sean D. Burns, Sudharshanan Raghunathan, 2012 .

Rinse additives for line-edge roughness control in 193-nm lithography

Marie Angelopoulos, Sean D. Burns, Margaret C. Lawson, 2004, SPIE Advanced Lithography.

Silicon containing polymer in applications for 193 nm high NA lithography processes

Karen Petrillo, Allen H. Gabor, Naftali E. Lustig, 2006, SPIE Advanced Lithography.

DSA patterning options for FinFET formation at 7nm node

Akiteru Ko, Nelson Felix, Mark Somervell, 2016, SPIE Advanced Lithography.

Rinse additives for defect suppression in 193-nm and 248-nm lithogrophy

Dario L. Goldfarb, Marie Angelopoulos, Sean D. Burns, 2004, SPIE Advanced Lithography.

32 nm logic patterning options with immersion lithography

Zachary Baum, Scott Halle, Vito Dai, 2008, SPIE Advanced Lithography.

Fundamental study of photoresist dissolution with real time spectroscopic ellipsometry and interferometry

Brian C. Trinque, Sean D. Burns, Gerard M. Schmid, 2003, SPIE Advanced Lithography.

Mesoscale Monte Carlo Simulation of Photoresist Processing

C. Grant Willson, Sean D. Burns, Gerard M. Schmid, 2004 .

Mesoscale modeling for SFIL simulating polymerization kinetics and densification

Yi Wei, William J. Dauksher, Kevin J. Nordquist, 2004, SPIE Advanced Lithography.

Understanding molecular-level effects during post-exposure processing

C. Grant Willson, Sean D. Burns, Gerard M. Schmid, 2001, SPIE Advanced Lithography.

Speeding up OPC by leveraging existing designs with machine learning

Sean D. Burns, Julian Dolby, Cheng Chi, 2021 .

Positive Resists Based on Non-polymeric Macromolecules

Hiroshi Ito, Dario L. Goldfarb, Sean D. Burns, 2005 .

Trilayer Development for 193 nm Immersion Lithography

Dario L. Goldfarb, Naftali E. Lustig, Sean D. Burns, 2007 .

Advancements to the critical ionization dissolution model

Lewis W. Flanagin, C. Grant Willson, Sean D. Burns, 2002 .

Effects of etch barrier densification on step and flash imprint lithography

William J. Dauksher, Kevin J. Nordquist, K. Gehoski, 2005 .

Process Window Centering for 22 nm lithography

Sean D. Burns, Colin J. Brodsky, Ralf Buengener, 2010, 2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC).