Johannes Ruoff
发表
Christoph Menke,
Bernd H. Kleemann,
Johannes Ruoff,
2005,
SPIE Optical Systems Design.
Donis G. Flagello,
Daniel Kraehmer,
Michael Totzeck,
2005
.
Johannes Ruoff,
2010,
Photomask Technology.
Günter Rudolph,
Wolfgang Singer,
Johannes Ruoff,
2015
.
Michael Totzeck,
Emil Schmitt-Weaver,
Bernd Geh,
2007,
SPIE Advanced Lithography.
Michael Totzeck,
Bernd Geh,
Johannes Ruoff,
2008,
Lithography Asia.
Johannes Ruoff,
2010
.
Johannes Ruoff,
Gregory William Forbes,
2017
.
Alois Herkommer,
Wolfgang Harnisch,
Johannes Ruoff,
2011,
Advanced Lithography.
Jens Timo Neumann,
Peter Evanschitzky,
Tim Fühner,
2013,
Advanced Lithography.
Jens Timo Neumann,
Chris Progler,
Eelco van Setten,
2007,
SPIE Photomask Technology.
Johannes Ruoff,
Gregory William Forbes,
2018
.
Winfried Kaiser,
Wolfgang Harnisch,
Johannes Ruoff,
2010,
Advanced Lithography.
Johannes Ruoff,
Bernd Kleemann,
Markus Seesselberg,
2016,
Optical Engineering + Applications.
Michael Totzeck,
Johannes Ruoff,
2010,
International Optical Design Conference.
Johannes Ruoff,
Bernd H Kleemann,
Ralf Arnold,
2005,
Optics letters.
Wolfgang Osten,
Johannes Ruoff,
Norbert Kerwien,
2007,
Journal of the Optical Society of America. A, Optics, image science, and vision.
Stefan Sinzinger,
Johannes Ruoff,
Robert Brunner,
2006,
Optics letters.
Johannes Ruoff,
Bernd Kleemann,
Markus Seesselberg,
2008
.