Edward W. Conrad

Optimization criteria for SRAM design: lithography contribution

Daniel C. Cole, Orest Bula, Edward W. Conrad, 1999, Advanced Lithography.

Electrical validation of through process OPC verification limits

Edward W. Conrad, James A. Bruce, Omprakash Jaiswal, 2010, Advanced Lithography.

Using advanced simulation to aid microlithography development

Eytan Barouch, Edward W. Conrad, Daniel C. Cole, 2001, Proc. IEEE.

Model-based verification for first time right manufacturing

Edward W. Conrad, James A. Bruce, Gregory J. Dick, 2005, SPIE Advanced Lithography.

Model considerations, calibration issues, and metrology methods for resist-bias models

Eytan Barouch, David P. Paul, Edward W. Conrad, 1999, Advanced Lithography.

Validating optical proximity correction with models, masks, and wafers

Emily Gallagher, Hidehiro Ikeda, Edward W. Conrad, 2007, SPIE Photomask Technology.

Electrical validation of through-process optical proximity correction verification limits

Edward W. Conrad, James A. Bruce, Omprakash Jaiswal, 2010 .