Eiji Kurose

157-nm lithography for 65-nm node SRAM-gate

Toshiro Itani, Takuya Hagiwara, Takamitsu Furukawa, 2003, SPIE Advanced Lithography.

Control of side-lobe intensity for attenuated phase-shifting mask in 157-nm lithography

Toshiro Itani, Kunio Watanabe, Toshifumi Suganaga, 2003, Photomask Japan.

Optimization of the chromium-shielding attenuated phase shift mask for 157-nm lithography

Toshiro Itani, Kiyoshi Fujii, Kunio Watanabe, 2004, Photomask Japan.

Impact of attenuated phase-shifting mask for 157-nm lithography with high numerical aperture lens

Toshiro Itani, Kunio Watanabe, Toshifumi Suganaga, 2003, SPIE Advanced Lithography.

157-nm lithography with extremely high numerical aperture lens for 45-nm technology node

Toshiro Itani, Takamitsu Furukawa, Kiyoshi Fujii, 2004, SPIE Advanced Lithography.