John A. Shelburne

Evaluation of poly(p-trimethylsilylstyrene and p-pentamethyldisilylstyrene sulfone)s as high-resolution electron-beam resists

Hiroshi Ono, Antoni S. Gozdz, Seiki Ito, 1991, Other Conferences.

Synthesis and lithographic evaluation of alternating copolymers of linear and cyclic alkenyl(di)silanes with sulfur dioxide

Antoni S. Gozdz, John A. Shelburne, 1991, Other Conferences.

Dry-etching process for the fabrication of optoelectronic gratings in III-V substrates

Antoni S. Gozdz, John A. Shelburne, R. S. Robinson, 1992, Other Conferences.

tert-Butoxycarbonylated novolac resins as chemically amplified imaging materials

Antoni S. Gozdz, John A. Shelburne, 1992, Advanced Lithography.