Ph. Brun

Electron beam direct write lithography flexibility for ASIC manufacturing: an opportunity for cost reduction (Keynote Paper)

M. Broekaart, F. Boeuf, S. Manakli, 2005, SPIE Advanced Lithography.

Integration of multi-level self-aligned CoWP barrier compatible with high performance BEOL

S. Chhun, M. Mellier, S. Jullian, 2006, 2006 International Interconnect Technology Conference.