D. Henry

Electron beam direct write lithography flexibility for ASIC manufacturing: an opportunity for cost reduction (Keynote Paper)

M. Broekaart, F. Boeuf, S. Manakli, 2005, SPIE Advanced Lithography.

Analysis of the ITER cryoplant operational modes

J. Y. Journeaux, J. M. Poncet, V. Kalinin, 2007 .

Electron beam direct write process development for sub 45nm CMOS manufacturing

S. Manakli, M. Jurdit, Laurent Pain, 2005, SPIE Advanced Lithography.

65 nm device manufacture using shaped E-Beam lithography

F. Leverd, R. Palla, M. Broekaart, 2003, Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference.