Jun-ichi Kon

Practical study on the electron-beam-only alignment strategy for the electron beam direct writing technology

Shinji Sugatani, Yasushi Takahashi, Yoshinori Kojima, 2013, Advanced Lithography.

Optimization of chemically amplified resist for high-volume manufacturing by electron-beam direct writing toward 14nm node and beyond

Akio Yamada, Shinji Sugatani, Yasushi Takahashi, 2012, Advanced Lithography.

Study of device mass production capability of the character projection based electron beam direct writing process technology toward 14 nm node and beyond

Yoshio Ito, Shinji Sugatani, Yasushi Takahashi, 2012, Advanced Lithography.

Study of device mass production capability of the character projection based electron beam direct writing process technology toward 14 nm node and beyond

Yoshio Ito, Shinji Sugatani, Yasushi Takahashi, 2012 .