Pierre Tomasini

Selective Epitaxy of Si/SiGe to Improve pMOS Devices by Recessed Source/Drain and/or Buried SiGe Channels

Akira Inoue, Rita Rooyackers, Denis Shamiryan, 2006 .

(Invited) Are Si/SiGe Tunneling Field-Effect Transistors a Good Idea?

Paul M. Solomon, Wilfried Haensch, Leland Chang, 2010 .

Enabling Moore's Law beyond CMOS technologies through heteroepitaxy

Matthias Bauer, Isaac Lauer, Shawn Thomas, 2010 .