Michael Kubis

发表

Overlay mark optimization using the KTD signal simulation system

Anat Marchelli, Karsten Gutjahr, Michael Kubis, 2009, Advanced Lithography.

The challenge of high-volume 193-nm semiconductor manufacturing

Michael Kubis, U. P. Schroder, S. Poelders, 2004, SPIE Advanced Lithography.

YieldStar: a new metrology platform for advanced lithography control

Kaustuve Bhattacharyya, Michael Kubis, Martin Ebert, 2011, European Mask and Lithography Conference.

Combined overlay, focus and CD metrology for leading edge lithography

Michael Kubis, Martin Ebert, Henry Megens, 2011, Advanced Lithography.

Critical dimension variations of I-line processes due to swing effects

Michael Kubis, C. Berger, Roberto Schiwon, 2006, SPIE Advanced Lithography.

Integrated scatterometry for tight overlay and CD control to enable 20-nm node wafer manufacturing.

Hugo Cramer, Jan Mulkens, Andre Engelen, 2013, Advanced Lithography.

Ultimate intra-wafer critical dimension uniformity control by using lithography and etch tool corrections

Patrick Jaenen, Mircea Dusa, Liesbeth Reijnen, 2016, Advanced Lithography.

Comparison of I-line and DUV high-energy implant litho processes

Michael Kubis, Uwe Schroeder, Roberto Schiwon, 2006, SPIE Advanced Lithography.

Holistic approach for overlay and edge placement error to meet the 5nm technology node requirements

Fei Wang, Jan Mulkens, Harm Dillen, 2018, Advanced Lithography.

Driving imaging and overlay performance to the limits with advanced lithography optimization

Jo Finders, Jan Mulkens, Michael Kubis, 2012, Advanced Lithography.

High order field-to-field corrections for imaging and overlay to achieve sub 20-nm lithography requirements

Jan Mulkens, Michael Kubis, Roelof de Graaf, 2013, Advanced Lithography.

Mask manufacturing mix-and-match in front-end wafer processing

Roland Jakob, Michael Kubis, Andreas Frangen, 2004, SPIE Photomask Technology.

Patterning control strategies for minimum edge placement error in logic devices

Jan Mulkens, Michael Kubis, Chris Spence, 2017, Advanced Lithography.

Overlay control using scatterometry based metrology (SCOM) in production environment

Anat Marchelli, Michael Kubis, Christian Sparka, 2008, SPIE Advanced Lithography.

Ultimate edge-placement control using combined etch and lithography patterning optimizations

Vito Rutigliani, Patrick Jaenen, Sandip Halder, 2018, Advanced Lithography.

Evaluation of a novel ultra small target technology supporting on-product overlay measurements

Arie den Boef, Maurits van der Schaar, Kaustuve Bhattacharyya, 2012, Advanced Lithography.

Overlay improvements using a real time machine learning algorithm

Jan Mulkens, Michael Kubis, Frank van de Mast, 2014, Advanced Lithography.

Holistic optimization architecture enabling sub-14-nm projection lithography

Jan Mulkens, Jos Benschop, Michael Kubis, 2014 .

How to improve overlay of highly deformed 3D NAND wafers

Michael Kubis, Jing Jin, Bart van Schravendijk, 2020, Advanced Lithography.

Integrated approach to improving local CD uniformity in EUV patterning

Katja Viatkina, Jan Hermans, Mircea Dusa, 2017, Advanced Lithography.

Evaluation of local CD and placement distribution on EUV mask and its impact on wafer

Andreas Frommhold, Paul van Adrichem, Jan Mulkens, 2019, Photomask Japan.

E-beam based EUV mask characterization for studying mask induced wafer effects

Jo Finders, Emily Gallagher, Qing Tian, 2018, Photomask Technology.

Matching OPC and masks on 300-mm lithography tools utilizing variable illumination settings

Michael Kubis, Uwe Schroeder, Karl Schumacher, 2004, SPIE Advanced Lithography.

Holistic feedforward control for the 5 nm logic node and beyond

Jan Mulkens, Robert Socha, Stefan Keij, 2019, Advanced Lithography.

On-product overlay enhancement using advanced litho-cluster control based on integrated metrology, ultra-small DBO targets and novel corrections

Arie den Boef, Maurits van der Schaar, Kaustuve Bhattacharyya, 2013, Advanced Lithography.

Critical dimension control on I-line steppers

Michael Kubis, Roberto Schiwon, Alexandra G. Grandpierre, 2005, SPIE Advanced Lithography.

Virtual overlay metrology for fault detection supported with integrated metrology and machine learning

Kevin Ryan, Sung-Ki Park, Michael Kubis, 2015, Advanced Lithography.

A method for projecting a mask arranged on a circuit pattern on a semiconductor wafer

Michael Kubis, Juergen Karl, Norbert Haase, 2003 .

Reducing the impact of etch-induced pattern shift on overlay by using lithography and etch tool corrections

Patrick Jaenen, Katja Viatkina, David Hellin, 2017, Advanced Lithography.