Vincent J. McGahay

A high-density 6.9 sq. /spl mu/m embedded SRAM cell in a high-performance 0.25 /spl mu/m-generation CMOS logic technology

Paul D. Agnello, Bomy A. Chen, E. Eld, 1996, International Electron Devices Meeting. Technical Digest.

Low-k/copper integration scheme suitable for ULSI manufacturing from 90nm to 45nm nodes

Fen Chen, Daniel C. Edelstein, Ian D. Melville, 2005, SPIE Optics East.