Satoshi Gonda

Comparison of SEM and AFM performances for LER reference metrology

Ryosuke Kizu, Ichiko Misumi, Akiko Hirai, 2020, Advanced Lithography.

Pixel length calibration using a pattern matching method for secondary-electron images

Ichiko Misumi, Satoshi Gonda, Kentaro Sugawara, 2013, Other Conferences.

Direct comparison of line edge roughness measurements by SEM and a metrological tilting-atomic force microscopy for reference metrology

Ryosuke Kizu, Ichiko Misumi, Akiko Hirai, 2020, Journal of Micro/Nanolithography, MEMS, and MOEMS.

Accurate vertical sidewall measurement by a metrological tilting-AFM for reference metrology of line edge roughness

Ryosuke Kizu, Ichiko Misumi, Akiko Hirai, 2019, Advanced Lithography.

Line edge roughness measurement on vertical sidewall for reference metrology using a metrological tilting atomic force microscope

Ryosuke Kizu, Ichiko Misumi, Akiko Hirai, 2020 .