Edwin Arthur Chandross

Evaluation of cycloolefin-maleic anhydride alternating copolymers as single-layer photoresists for 193-nm photolithography

Thomas I. Wallow, Elsa Reichmanis, Omkaram Nalamasu, 1996, Advanced Lithography.

The Role of Carbonyl Groups in the Photoluminescence of Poly(p-phenylenevinylene)

Timothy M. Miller, Fotios Papadimitrakopoulos, Robert L. Opila, 1994 .

Embossed Optical Waveguides

E. A. Franke, Edwin Arthur Chandross, H. P. Weber, 1972 .

A novel approach to o‐nitrobenzyl photochemistry for resists

Elsa Reichmanis, Edwin Arthur Chandross, E. Reichmanis, 1981 .

The Effect of Substituents on the Photosensitivity of 2‐Nitrobenzyl Ester Deep U.V. Resists

Elsa Reichmanis, Edwin Arthur Chandross, C. W. Wilkins, 1983 .