James Passarelli

Low-line edge roughness extreme ultraviolet photoresists of organotin carboxylates

Mark Neisser, Brian Cardineau, Robert L. Brainard, 2015 .

EUV resists comprised of main group organometallic oligomeric materials

Yasin Ekinci, Michaela Vockenhuber, Brian Cardineau, 2014, Advanced Lithography.

Platinum and palladium oxalates: positive-tone extreme ultraviolet resists

Yasin Ekinci, James Passarelli, Miriam Sortland, 2015 .

Positive-tone EUV resists: complexes of platinum and palladium

Yasin Ekinci, Michaela Vockenhuber, Robert L. Brainard, 2015, Advanced Lithography.

High-sensitivity molecular organometallic resist for EUV (MORE)

Yasin Ekinci, Michaela Vockenhuber, Robert L. Brainard, 2015, Advanced Lithography.

Organometallic carboxylate resists for extreme ultraviolet with high sensitivity

Yasin Ekinci, James Passarelli, Miriam Sortland, 2015 .

Bismuth Resists for EUV Lithography

Brian Cardineau, Robert L. Brainard, James Passarelli, 2014 .