Kelly Malone

193 lithography and RELACS processing for BEOL lithography

Linda M. Hadel, Richard A. Ferguson, Karen Petrillo, 2001, SPIE Advanced Lithography.

Low-k/copper integration scheme suitable for ULSI manufacturing from 90nm to 45nm nodes

Fen Chen, Daniel C. Edelstein, Ian D. Melville, 2005, SPIE Optics East.

Session C1: APS, AAPT, and SPS Poster Session - Study of a Detector to Count a Cs-136 Source in Xenon

Kelly Malone, Andrea Pocar, 2011 .