Noritaka Ashizawa

High-radiance LDP source for mask-inspection application

Guido Mertens, Yusuke Teramoto, Hironobu Yabuta, 2015, Advanced Lithography.

High-radiance LDP source for mask inspection and beam line applications (Conference Presentation)

Guido Mertens, Klaus Bergmann, Yuta Taniguchi, 2017, Advanced Lithography.

High-radiance LDP source for mask inspection application

Guido Mertens, Hiroto Sato, Takahiro Shirai, 2014, Advanced Lithography.

High-radiance LDP source: clean, reliable, and stable EUV source for mask inspection

Guido Mertens, Klaus Bergmann, Yuta Taniguchi, 2016, SPIE Advanced Lithography.