Raja Athimulam

Double patterning with dual hard mask for 28-nm node devices and below

Hubert Hody, Vasile Paraschiv, E. Vecchio, 2013 .

Double patterning with dual hard mask for 28nm node devices and below

Hubert Hody, Vasile Paraschiv, Gustaf Winroth, 2013, Advanced Lithography.