Kiyoshi Fujii

Yoshisada Murotsu, Akira Mitsuya, Kiyoshi Fujii, 1993, Proceedings of 1993 IEEE/RSJ International Conference on Intelligent Robots and Systems (IROS '93).

157-nm single-layer resist based on novel monocyclic fluorinated polymer

Yoko Takebe, Osamu Yokokoji, Toshiro Itani, 2004, SPIE Advanced Lithography.

Sub-40nm pattern fabrication in 157nm interferometric immersion lithography

Akira Sumitani, Masato Moriya, Takuya Hagiwara, 2006, SPIE Advanced Lithography.

Optimization of the chromium-shielding attenuated phase shift mask for 157-nm lithography

Toshiro Itani, Kiyoshi Fujii, Kunio Watanabe, 2004, Photomask Japan.

Overlay and critical dimension control in proximity X-ray lithography : Special issue on advanced semiconductor processing technology

Yuusuke Tanaka, Katsumi Suzuki, Kiyoshi Fujii, 2001 .

Development of SF6-Gas-immersed Middle-Capacity transformer with Sheet Winding

Mamoru Yamada, Kenji Ikeda, Masahiro Miyamoto, 1996 .

Development and evaluation of an F2 laser for immersion interference lithography at 157nm

Shinji Nagai, Akira Sumitani, Masato Moriya, 2004, SPIE Advanced Lithography.

Characterization of TFE/norbornene-based fluoropolymer resist for 157-nm lithography

Hirokazu Aoyama, Takuji Ishikawa, Tetsuhiro Kodani, 2004, SPIE Advanced Lithography.

157-nm chromeless phase lithography for 45-nm SRAM gate

Toshiro Itani, Takuya Hagiwara, Takamitsu Furukawa, 2004, SPIE Advanced Lithography.

MIXED MODE FRACTURE CRITERION BY COMBINED STRESS HYPOTHESIS AND ITS EXPERIMENTAL VERIFICATION

Koji Nakagawa, Kiyoshi Fujii, Chikayoshi Yatomi, 1987 .

157-nm chromeless phase lithography with extremely high numerical aperture

Toshiro Itani, Takuya Hagiwara, Kiyoshi Fujii, 2004, SPIE Advanced Lithography.

Discriminator of paper money

Kiyoshi Fujii, Shinya Uchida, Moriatsu Kawakami, 1987 .

157-nm lithography with extremely high numerical aperture lens for 45-nm technology node

Toshiro Itani, Takamitsu Furukawa, Kiyoshi Fujii, 2004, SPIE Advanced Lithography.

Fabrication of NIST-format x-ray masks with 4-Gb DRAM patterns

Kenichiro Suzuki, Kiyoshi Fujii, Y. Tanaka, 2001, Photomask Japan.

Analysis of x-ray mask distortion

Katsumi Suzuki, Kiyoshi Fujii, Y. Tanaka, 1997, Photomask and Next Generation Lithography Mask Technology.

Apparatus for inspecting the thickness of a banknote

Kiyoshi Fujii, Mitsushiro Ikeda, 1986 .

Production x-ray lithography stepper for 100-nm device fabrication

Katsumi Suzuki, Xuan Li, Kiyoshi Fujii, 2001, SPIE Advanced Lithography.

A study of 193-nm immersion lithography using novel high refractive index fluids

Julius Joseph Santillan, Toshiro Itani, Shin Fukuda, 2006 .

Low-dose exposure technique for 100-nm-diam hole replication in x-ray lithography

Takao Taguchi, Masaki Yamabe, Kiyoshi Fujii, 1998 .

Compact synchrotron radiation lithography system for 70 nm device manufacturing

Kiyoshi Fujii, Tsutomu Miyatake, Sayumi Hirose, 2001 .

Estimation of Optimum Electron-Beam Projection Lithography Mask Biases Taking Coulomb Beam Blur into Consideration

Kiyoshi Fujii, Takao Tamura, Yukinori Ochiai, 2003 .

Evaluation of new x-ray stepper, the XRA

Takao Taguchi, Hajime Aoyama, Kiyoshi Fujii, 2001 .

Sub‐half‐micron metal–oxide–semiconductor device fabrication using a compact synchrotron radiation lithography system

Yuusuke Tanaka, Kiyoshi Fujii, Takuya Yoshihara, 1993 .