Jin-Back Park

Process latitude dependency on local photomask haze defect in 70-nm binary intensity mask

Sung-Jin Kim, Young-Min Kang, Jaisoon Kim, 2007, Photomask Japan.

Reticle haze measurement by spectroscopic ellipsometry

Hye-Keun Oh, Young-Hoon Kim, Jin-Back Park, 2005, Digest of Papers Microprocesses and Nanotechnology 2005.

Mask process monitoring with optical CD measurements for sub-50-nm

Han-Ku Cho, Dong-Hoon Chung, Yong-Hoon Kim, 2008, Photomask Technology.

The effect of transmission reduction by reticle haze formation

Sung-Jin Kim, Hye-Keun Oh, Younghoon Kim, 2006, SPIE Advanced Lithography.

Registration performance on EUV masks using high-resolution registration metrology

Dirk Beyer, Steffen Steinert, Thomas Scherübl, 2016, Photomask Technology.

The optical CD metrology for EUV mask

Han-Ku Cho, Dong-gun Lee, Jin-Back Park, 2010, Photomask Japan.