Wook Chang

Process latitude dependency on local photomask haze defect in 70-nm binary intensity mask

Sung-Jin Kim, Young-Min Kang, Jaisoon Kim, 2007, Photomask Japan.

Characteristics and prevention of pattern collapse in EUV lithography

Chang-Moon Lim, Young-Min Kang, Jaisoon Kim, 2007, SPIE Advanced Lithography.

Observation of adsorption and permeation phenomena in silica membrane system through molecular dynamics simulation

Wook Chang, Tai-yong Lee, Tai-yong Lee, 2004, Comput. Chem. Eng..

Design of a pen-shaped input device using the low-cost inertial measurement units

Kyoung-Ho Kang, Wook Chang, Won-chul Bang, 2003 .

32-nm pattern collapse modeling with radial distance and rinse speed

Hye-Keun Oh, Wook Chang, Suk-Joo Lee, 2007, SPIE Advanced Lithography.

A miniaturized attitude estimation system for a gesture-based input device with fuzzy logic approach

Jing Yang, Kyoung-Ho Kang, Wook Chang, 2003 .