Yair Elblinger

Scanner qualification with IntenCD based reticle error correction

Jo Finders, Shmoolik Mangan, Ilan Englard, 2010, Advanced Lithography.

IntenCD technology for fast and accurate scanner performance determination

Jo Finders, Shmoolik Mangan, Ilan Englard, 2009, Photomask Technology.

Aerial imaging for FABs: productivity and yield aspects

Shmoolik Mangan, Lior Shoval, Yair Elblinger, 2009, Advanced Lithography.

Novel lithography approach using feed-forward mask-based wafer CDU correction increase fab productivity and yield

Jo Finders, Baukje Wisse, Shmoolik Mangan, 2009, Advanced Lithography.