Tae-Jun You

Sub-100-nm DRAM cell patterning results and relation with lens aberration at 248-nm lithography era

Jin-Soo Kim, Keun-Kyu Kong, Hyeong-Soo Kim, 2003, SPIE Advanced Lithography.

CD metrology for avoiding shrinkage of ArF resist patterns in 100 nm ArF lithography

Cheol-Kyu Bok, Ki-Soo Shin, Tae-Jun You, 2002, SPIE Advanced Lithography.