Mary Kate Boggiano

Alicyclic photoresists for CO2-based microlithography at 157 nm

Joseph M. DeSimone, Mary Kate Boggiano, 2003, SPIE Advanced Lithography.

Photoresists for CO2-based next-generation microlithography

Joseph M. DeSimone, Mary Kate Boggiano, Colin D. Wood, 2005, SPIE Advanced Lithography.

Synthesis of photoresists for 157-nm microlithography using CO2

Joseph M. DeSimone, Mary Kate Boggiano, 2004, SPIE Advanced Lithography.

New Mesotextured Hybrid Materials Made from Assemblies of Dendrimers and Titanium(IV)-Oxo-Organo Clusters.

Mary Kate Boggiano, G. Soler-Illia, A. Caminade, 2000, Angewandte Chemie.

Addition Polymerization Toward the Synthesis of Photoresists for Microlithography with Carbon Dioxide Development

Mary Kate Boggiano, 2006 .

New Mesotextured Hybrid Materials Made from Assemblies of Dendrimers and Titanium(IV)-Oxo-Organo Clusters.

Mary Kate Boggiano, Galo J. A. A. Soler-Illia, A. Caminade, 2000, Angewandte Chemie.