Hong-Nien Lin

Evaluation of S/D Resistance (RSD) and Strain Scalability by Mechanical-bending Approach

Wen-Chin Lee, Chih-Sheng Chang, Kehuey Wu, 2007, 2007 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA).

A low operating power FinFET transistor module featuring scaled gate stack and strain engineering for 32/28nm SoC technology

Min Cao, Feng Yuan, Tsung-Lin Lee, 2010, 2010 International Electron Devices Meeting.

Ultimate contact resistance scaling enabled by an accurate contact resistivity extraction methodology for sub-20 nm node

Wen-Chin Lee, Hong-Nien Lin, Wen-Wei Hsu, 2006, 2009 Symposium on VLSI Technology.

The impact of uniaxial strain engineering on channel backscattering in nanoscale MOSFETs

Horng-Chih Lin, Tiao-Yuan Huang, Wen-Chin Lee, 2005, Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005..

Correlating drain-current with strain-induced mobility in nanoscale strained CMOSFETs

Horng-Chih Lin, Tiao-Yuan Huang, Wen-Chin Lee, 2006, IEEE Electron Device Letters.