Rene A. Claus
发表
Kenneth A. Goldberg,
Laura Waller,
Patrick P. Naulleau,
2015,
Advanced Lithography.
Laura Waller,
Patrick P. Naulleau,
Andrew R. Neureuther,
2014,
Photomask Technology.
Andrew R. Neureuther,
Laura Waller,
Patrick P. Naulleau,
2014,
Advanced Lithography.
Laura Waller,
Lei Tian,
Justin Dauwels,
2014,
2014 IEEE International Conference on Acoustics, Speech and Signal Processing (ICASSP).
Kenneth A. Goldberg,
Patrick P. Naulleau,
Iacopo Mochi,
2013,
Photomask Technology.
Kenneth A. Goldberg,
Patrick P. Naulleau,
Eric M. Gullikson,
2014,
Photomask and Next Generation Lithography Mask Technology.
Andrew R. Neureuther,
Patrick P. Naulleau,
Rene A. Claus,
2013,
Advanced Lithography.
Kenneth A. Goldberg,
Patrick P. Naulleau,
Antoine Wojdyla,
2015,
SPIE Photomask Technology.
Kenneth A. Goldberg,
Laura Waller,
Patrick P. Naulleau,
2015,
Advanced Lithography.
Rene A. Claus,
L. Tian,
L. Waller,
2014,
Optics express.
Laura Waller,
Lei Tian,
Justin Dauwels,
2013
.
Partially Coherent Quantitative Phase Retrieval with Applications to Extreme Ultraviolet Lithography
Rene A. Claus,
2015
.
Laura Waller,
Rene A. Claus,
Patrick P Naulleau,
2015,
Optics express.
Rene A. Claus,
L. Waller,
J. Dauwels,
2014,
Optics express.