Thuc Dam

发表

Double patterning for 56 nm pitch test designs using inverse lithography

Thuc Dam, Robert P. Gleason, Paul Rissman, 2011, Photomask Technology.

Logic Block Level Design-Technology Co-Optimization is the New Moore's Law (Invited)

Thuc Dam, Victor Moroz, Xi-Wei Lin, 2020, 2020 4th IEEE Electron Devices Technology & Manufacturing Conference (EDTM).

Impact of flare on source mask optimization in EUVL for 7nm technology node

Yayi Wei, Lisong Dong, Thuc Dam, 2020, Advanced Lithography.

Exploration of complex metal 2D design rules using inverse lithography

Steve Prins, Guangming Xiao, Bob Gleason, 2009, Advanced Lithography.

Evaluation of lithographic benefits of using ILT techniques for 22nm-node

Ki-Ho Baik, Yunfei Deng, Jongwook Kye, 2010, Advanced Lithography.

Considering MEEF in inverse lithography technology (ILT) and source mask optimization (SMO)

Vikram Tolani, Guangming Xiao, Bob Gleason, 2008, Photomask Technology.

Computational inspection applied to a mask inspection system with advanced aerial imaging capability

Vikram Tolani, Thuc Dam, Linyong Pang, 2010, Advanced Lithography.

Cost effective solution using inverse lithography OPC for DRAM random contact layer

Guangming Xiao, Kevin Lucas, Munhoe Do, 2017, Advanced Lithography.

Applying ILT mask synthesis for co-optimizing design rules and DSA process characteristics

Thuc Dam, William Stanton, 2014, Advanced Lithography.

Comparison of clear-field and dark-field images with optimized masks

Bob Gleason, Thuc Dam, Robert Sinn, 2011, Advanced Lithography.

Toward a consistent and accurate approach to modeling projection optics

Vikram Tolani, Thuc Dam, Danping Peng, 2010, Advanced Lithography.

Inverse lithography as a DFM tool: accelerating design rule development with model-based assist feature placement, fast optical proximity correction and lithographic hotspot detection

Steve Prins, Guangming Xiao, Bob Gleason, 2008, SPIE Advanced Lithography.

Proteus SMO for process window improvement

Richer Yang, Andy Lan, Thuc Dam, 2020 .

Evaluation of inverse lithography technology for 55nm-node memory device

Ki-Ho Baik, Ying Cui, Donggyu Yim, 2008, SPIE Advanced Lithography.

Computational inspection applied to a mask inspection system with advanced aerial imaging capability

Vikram Tolani, Linyong Pang, Thuc Dam, 2010, Photomask Japan.

Source mask optimization (SMO) at full chip scale using inverse lithography technology (ILT) based on level set methods

Vikram Tolani, Guangming Xiao, Bob Gleason, 2009, Lithography Asia.

Optimization from design rules, source and mask, to full chip with a single computational lithography framework: level-set-methods-based inverse lithography technology (ILT)

Vikram Tolani, Guangming Xiao, Bob Gleason, 2010, Advanced Lithography.

Litho/Design Co-Optimization and Area Scaling for the 22-nm Logic Node

Ki-Ho Baik, Bob Gleason, Scott William Jessen, 2010 .

Resist 3D aware mask solution with ILT for hotspot repair

Thomas Schmoeller, Guangming Xiao, Thuc Dam, 2017, Advanced Lithography.

Source-mask optimization (SMO): from theory to practice

Ki-Ho Baik, Vikram Tolani, Bob Gleason, 2010, Advanced Lithography.