W.R. Tonti

MOS Technology Drivers

W.R. Tonti, 2008, IEEE Transactions on Device and Materials Reliability.

Reliability and design qualification of a sub-micron tungsten silicide E-Fuse

J.A. Fifield, W.R. Tonti, J. Higgins, 2004, 2004 IEEE International Reliability Physics Symposium. Proceedings.