Ken Chang

A complete methodology towards accuracy and lot-to-lot robustness in on-product overlay metrology using flexible wavelength selection

Vincent Couraudon, Arie den Boef, Kaustuve Bhattacharyya, 2017, Advanced Lithography.

Color mixing in overlay metrology for greater accuracy and robustness

Arie den Boef, Kaustuve Bhattacharyya, John Lin, 2019, Advanced Lithography.

Multi-wavelength approach towards on-product overlay accuracy and robustness

Arie den Boef, Kaustuve Bhattacharyya, John Lin, 2018, Advanced Lithography.

Characterization of metrology to device overlay offset and novel methods to minimize it

Jeff Lin, Kaustuve Bhattacharyya, Marc Noot, 2021, Advanced Lithography.