Eason Su

A complete methodology towards accuracy and lot-to-lot robustness in on-product overlay metrology using flexible wavelength selection

Vincent Couraudon, Arie den Boef, Kaustuve Bhattacharyya, 2017, Advanced Lithography.

Color mixing in overlay metrology for greater accuracy and robustness

Arie den Boef, Kaustuve Bhattacharyya, John Lin, 2019, Advanced Lithography.

Holistic approach using accuracy of diffraction-based integrated metrology to improve on-product performance, reduce cycle time, and cost at litho

Vincent Couraudon, Arie den Boef, Youping Zhang, 2015, Advanced Lithography.

Multi-wavelength approach towards on-product overlay accuracy and robustness

Arie den Boef, Kaustuve Bhattacharyya, John Lin, 2018, Advanced Lithography.

Reducing the pattern redundancy in optical proximity correction modeling by analyzing the pattern linearity

Qiliang Yan, Lawrence S. Melvin, Jianliang Li, 2010 .