Herbert Vonach

Large-field ion optics for projection and proximity printing and for maskless lithography (ML2)

Elmar Platzgummer, Hans Loeschner, Patrick W. de Jager, 2002, SPIE Advanced Lithography.

Multibeam particle lithography

Hans Loeschner, Gerhard Stengl, Herbert Vonach, 1999 .

Projection ion beam lithography

R. W. Hill, Hans Loschner, Gerhard Stengl, 1993 .

In situ distortion measurement of an ion projector with 5× ion‐optical reduction

Hans Loschner, Gerhard Stengl, P. Wolf, 1992 .

Large-field particle beam optics for projection and proximity printing and for maskless lithography

Elmar Platzgummer, Hans Loeschner, Joerg Butschke, 2003 .

Novel electrostatic column for ion projection lithography

R. W. Hill, Lloyd R. Harriott, Ka-Ngo Leung, 1994 .

Distortion analysis of stencil masks with stress‐relief structures

Hans Loschner, John C. Wolfe, Gerhard Stengl, 1995 .

Experimental results of the stochastic Coulomb interaction in ion projection lithography

F. Shi, Rainer Kaesmaier, Hans Loschner, 1999 .