Kathleen Nafus

发表

Tunable bandwidth for application-specific SAxP process enhancement

Will Conley, Gian Francesco Lorusso, Paolo Alagna, 2018, Advanced Lithography.

Defect mitigation and root cause studies in IMEC's 14nm half-pitch chemo-epitaxy DSA flow

Lieve Van Look, Yi Cao, Hari Pathangi, 2015, Advanced Lithography.

PSCAR optimization to reduce EUV resist roughness with sensitization using Resist Formulation Optimizer (RFO)

Geert Vandenberghe, Hans-Jürgen Stock, Peter De Bisschop, 2019, Advanced Lithography.

Immersion effects on lithography system performance

David Laidler, Philippe Leray, Shaunee Cheng, 2006, SPIE Advanced Lithography.

Advances in directed self assembly integration and manufacturability at 300 mm

Seiji Nagahara, Kathleen Nafus, Benjamen Rathsack, 2013, Advanced Lithography.

Photosensitized Chemically Amplified Resist (PSCAR) 2.0 for high-throughput and high-resolution EUV lithography: dual photosensitization of acid generation and quencher decomposition by flood exposure

Geert Vandenberghe, Hans-Jürgen Stock, Yasin Ekinci, 2017, Advanced Lithography.

Initial process evaluation for next generation immersion technology node

Kathleen Nafus, Masashi Enomoto, Shinichi Hatakeyama, 2007, SPIE Advanced Lithography.

Frequency multiplication of lamellar phase block copolymers with grapho-epitaxy directed self-assembly sensitivity to prepattern

Ivan Pollentier, Roel Gronheid, Kathleen Nafus, 2012 .

EUV process establishment through litho and etch for N7 node

Ming Mao, Philippe Foubert, Minoru Kubota, 2016, SPIE Advanced Lithography.

Dry development rinse process for ultimate resolution improvement via pattern collapse mitigation

Geert Vandenberghe, Danilo De Simone, Arjun Singh, 2015, Advanced Lithography.

CLEAN TRACK solutions for defectivity and CD control towards 5 nm and smaller nodes

Satoru Shimura, Philippe Foubert, Kathleen Nafus, 2020, Advanced Lithography.

Analyzing block placement errors in SADP patterning

Carlos Fonseca, Satoru Shimura, Shinji Kobayashi, 2016, SPIE Advanced Lithography.

EUV patterning improvement toward high-volume manufacturing

Anne-Marie Goethals, Philippe Foubert, Kathleen Nafus, 2015, Advanced Lithography.

New coater/developer technologies for CD control and defectivity reduction towards 5 nm and smaller nodes

Philippe Foubert, Kathleen Nafus, Shinichiro Kawakami, 2019, Photomask Technology.

Improvement of CD stability and defectivity in resist coating and developing process in EUV lithography process

Philippe Foubert, Kathleen Nafus, Shinichiro Kawakami, 2018, Photomask Technology.

Calibrated PSCAR stochastic simulation

Geert Vandenberghe, Hans-Jürgen Stock, Peter De Bisschop, 2019, Advanced Lithography.

All track directed self-assembly of block copolymers: process flow and origin of defects

Hengpeng Wu, Yi Cao, Roel Gronheid, 2012, Advanced Lithography.

Manufacturability improvements in EUV resist processing toward NXE:3300 processing

Anne-Marie Goethals, Satoru Shimura, Philippe Foubert, 2014, Advanced Lithography.

Advances and challenges in dual-tone development process optimization

Carlos Fonseca, Roel Gronheid, Mark Somervell, 2009, Advanced Lithography.

EUV secondary electron blur at the 22nm half pitch node

Carlos Fonseca, John J. Biafore, Roel Gronheid, 2011, Advanced Lithography.

Study of DSA interaction range using Gaussian convolution

Germain Fenger, Hon-Sum Philip Wong, Joost Bekaert, 2015, Advanced Lithography.

Defectivity reduction by optimization of 193-nm immersion lithography using an interfaced exposure-track system

Philippe Foubert, Youri van Dommelen, Kathleen Nafus, 2006, SPIE Advanced Lithography.

Pattern uniformity control in integrated structures

Carlos Fonseca, Satoru Shimura, Shinji Kobayashi, 2017, Advanced Lithography.

Comparison of directed self-assembly integrations

Roel Gronheid, Kathleen Nafus, Paul Nealey, 2012, Other Conferences.

Technology for defectivity improvement in resist coating and developing process in EUV lithography process

Philippe Foubert, Kathleen Nafus, Shinichiro Kawakami, 2017, Photomask Technology.

Resist fundamentals for resolution, LER, and sensitivity (RLS) performance tradeoffs and their relation to micro-bridging defects

Alessandro Vaglio Pret, Roel Gronheid, Kathleen Nafus, 2009, Advanced Lithography.

Self-aligned block technology: a step toward further scaling

Carlos Fonseca, Chris Wilson, Julien Ryckaert, 2017, Advanced Lithography.

EUV resist sensitization and roughness improvement by PSCAR with in-line UV flood exposure system

Geert Vandenberghe, Hans-Jürgen Stock, Kazuhiro Takeshita, 2018, Advanced Lithography.

Technology for defectivity improvement in resist coating and developing process in EUV lithography process

Philippe Foubert, Kathleen Nafus, Shinichiro Kawakami, 2017, Advanced Lithography.

Understanding EUV resist dissolution characteristics and its impact to RLS limitations

Carlos Fonseca, Roel Gronheid, Gustaf Winroth, 2011, Advanced Lithography.

Novel technologies in coater/developer to enhance the CD stability and to improve the defectivity toward N7 and smaller nodes

Makoto Muramatsu, Philippe Foubert, Kathleen Nafus, 2019, Advanced Lithography.

Image contrast contributions to immersion lithography defect formation and process yield

Eric Hendrickx, Roel Gronheid, Kathleen Nafus, 2008, SPIE Advanced Lithography.

Process sensitivities in exemplary chemo-epitaxy directed self-assembly integration

Yi Cao, Roel Gronheid, Kathleen Nafus, 2013, Advanced Lithography.

Experimental study of sub-DSA resolution assist features (SDRAF)

Geert Vandenberghe, Hon-Sum Philip Wong, He Yi, 2015, Advanced Lithography.

Implementation of a chemo-epitaxy flow for directed self-assembly on 300-mm wafer processing equipment

Mark Neisser, Yi Cao, Roel Gronheid, 2012 .

High speed EUV using post processing and self-aligned double patterning as a speed enhancement technique

Craig Higgins, Jerome Wandell, Kathleen Nafus, 2014, Advanced Lithography.

Advances in dual-tone development for pitch frequency doubling

Carlos Fonseca, Roel Gronheid, Mark Somervell, 2010, Advanced Lithography.

Novel metal containing resists for EUV lithography extendibility

Geert Vandenberghe, Danilo De Simone, Ivan Pollentier, 2016, SPIE Advanced Lithography.

High-volume manufacturing equipment and processing for directed self-assembly applications

Seiji Nagahara, Kathleen Nafus, Benjamen Rathsack, 2014, Advanced Lithography.

Image contrast enhancement of multiple patterning features through lower light source bandwidth

Serge Biesemans, Paolo Alagna, Greg Rechtsteiner, 2017, Advanced Lithography.

Resist coating and developing process technology toward EUV manufacturing sub 7nm node

Philippe Foubert, Kathleen Nafus, Shinichiro Kawakami, 2018, 2018 International Symposium on Semiconductor Manufacturing (ISSM).

A CDU comparison of double patterning process options using Monte Carlo simulation

Shaunee Cheng, Philippe Foubert, Kathleen Nafus, 2009, Advanced Lithography.

Simulation of sub-90-nm node complementary phase-shift processes with ArF lithography

Mosong Cheng, Kathleen Nafus, Benjamin C. P. Ho, 2003, SPIE Advanced Lithography.

EUV RLS performance tradeoffs for a polymer bound PAG resist

Alessandro Vaglio Pret, Roel Gronheid, Kathleen Nafus, 2010, Advanced Lithography.

Driving DSA into volume manufacturing

Seiji Nagahara, Kathleen Nafus, Shinichiro Kawakami, 2015, Advanced Lithography.

Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow

Yi Cao, Hari Pathangi, Roel Gronheid, 2015 .

LWR reduction by novel lithographic and etch techniques

Satoru Shimura, Tetsu Kawasaki, Shinji Kobayashi, 2010, Advanced Lithography.

Line-edge roughness (LER) optimization on 300-mm DUV alternating phase shift (altPSM) processes

Mosong Cheng, Kathleen Nafus, Bob Brown, 2003, SPIE Advanced Lithography.

Rectification of EUV-patterned contact holes using directed self-assembly

Roel Gronheid, Arjun Singh, Kathleen Nafus, 2013, Advanced Lithography.

Using process monitor wafers to understand directed self-assembly defects

Yi Cao, Roel Gronheid, Mark Somervell, 2013, Advanced Lithography.

EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity, and stochastic defectivity

Hans-Jürgen Stock, Danilo De Simone, John S. Petersen, 2020, Advanced Lithography.

Monte Carlo simulation of edge placement error

Carlos Fonseca, Satoru Shimura, Shinji Kobayashi, 2018, Advanced Lithography.

Pupil optimization for after etch defectivity: what imaging metrics matter?

Gijsbert Rispens, Andreas Frommhold, Kathleen Nafus, 2021, Photomask Technology.

Addressing EUV patterning challenges towards the limits of NA 0.33 EUV exposure

Makoto Muramatsu, Satoru Shimura, Philippe Foubert, 2021, International Conference on Extreme Ultraviolet Lithography 2021.

EUV resist performance enhancement by UV flood exposure for high NA EUV lithography

Geert Vandenberghe, Makoto Muramatsu, Danilo De Simone, 2021, Advanced Lithography.

Novel processing technologies for advanced EUV patterning materials using metal oxide resist (MOR)

Satoru Shimura, Danilo De Simone, Philippe Foubert, 2021, Advanced Lithography.

EUV defect reduction activities using coater/developer and etching technique

Satoru Shimura, Kathleen Nafus, Kenta Ono, 2021, Advanced Lithography.

Effect of PAG distribution on ArF and EUV resist performance

Roel Gronheid, Kathleen Nafus, Shinichi Hatakeyama, 2009 .

Geometric Control of Chemically Nano-patterned Substrates for Feature Multiplication Using Directed Self-Assembly of Block Copolymers

Hengpeng Wu, Yi Cao, Roel Gronheid, 2012 .