Elio De Chiara

CD-uniformity for 45nm NV memory on product-stack

Paolo Canestrari, Benedetta Triulzi, Umberto Iessi, 2010, Advanced Lithography.

High-order distortion effects induced by extreme off-axis illuminations at hyper NA lithography

Paolo Canestrari, Lionel Brige, Gianfranco Capetti, 2009, Advanced Lithography.

Laser bandwidth effect on overlay budget and imaging for the 45 nm and 32nm technology nodes with immersion lithography

Michiel Kupers, Ivan Lalovic, Umberto Iessi, 2010, Advanced Lithography.

Double patterning overlay and CD budget for 32 nm technology node

Sara Loi, Umberto Iessi, Antonio Mani, 2008, SPIE Advanced Lithography.