Hiroyuki Kondo

发表

J1210101 Extraction of latent Kansei based on void material synthesis

Hideyoshi Yanagisawa, Hiroyuki Kondo, 2015 .

Development of EUV lithography tool technologies at Nikon

Takashi Yamaguchi, Hiroyuki Kondo, Hiroshi Chiba, 2012, Advanced Lithography.

2405 Advanced kansei assessment of void material using multimodal sensory manipulation

Hideyoshi Yanagisawa, Hiroyuki Kondo, 2015 .

Development progress of optics for EUVL at Nikon

Hiroyuki Kondo, Hiroshi Chiba, Katsuhiko Murakami, 2009, Advanced Lithography.

X-ray photoelectron spectroscopy with a laser plasma source

Hiroyuki Kondo, Peixiang Lu, Toshihisa Tomie, 1997, Optics & Photonics.

Development of EUV lithography tools at Nikon

Hiroyuki Kondo, Hiroshi Chiba, Tetsuya Oshino, 2011, Advanced Lithography.

Observation of living cells by x-ray microscopy with a laser-plasma x-ray source

Hiroyuki Kondo, Toshihisa Tomie, Toshikazu Majima, 1991, Optics & Photonics.

Reflectance change of Si- and Ru-capped Mo/Si multilayer mirrors caused by intense EUV irradiation

Hiroyuki Kondo, Masahito Niibe, Takashi Aoki, 2005, SPIE Advanced Lithography.

Development of an EUV reflectometer using a laser plasma x-ray source

Hiroyuki Kondo, Katsuhiko Murakami, Tetsuya Oshino, 2000, SPIE Optics + Photonics.

Development of optics for EUV lithography tools

Hiroyuki Kondo, Hiroshi Chiba, Katsuhiko Murakami, 2007, SPIE Advanced Lithography.

Development status of projection optics and illumination optics for EUV1

Hiroyuki Kondo, Hiroshi Chiba, Katsuhiko Murakami, 2008, SPIE Advanced Lithography.

High-density aluminum plasma produced by a picosecond KrF laser pulse

Hiroyuki Kondo, Toshihisa Tomie, James N. Broughton, 1992, Optics & Photonics.

Development of EUV lithography tools at Nikon

Hiroyuki Kondo, Hiroshi Chiba, Kenji Morita, 2008, Lithography Asia.

Development of illumination optics and projection optics for high-NA EUV exposure tool (HiNA)

Kazuya Ota, Iwao Nishiyama, Hiroaki Oizumi, 2003, SPIE Advanced Lithography.

Development of an EUV reflectometer using a single line emission from a laser-plasma x-ray source

Hiroyuki Kondo, Katsuhiko Murakami, Tetsuya Oshino, 2001, SPIE Advanced Lithography.

Fabrication of aspherical mirrors for EUV projection optics set-3 of HiNA

Iwao Nishiyama, Hiroaki Oizumi, Shinji Okazaki, 2004, SPIE Optics + Photonics.

Development of an experimental EUV interferometer for benchmarking several EUV wavefront metrology schemes

Kazuya Ota, Masanobu Hasegawa, Akiyoshi Suzuki, 2003, SPIE Advanced Lithography.

OS01-3-2 Accuracy of Real-time Deformation Measurement Using Sampling Moire Camera

Motoharu Fujigaki, Akihiro Masaya, Hiroyuki Kondo, 2011 .

Apparatus for contamination control development in EUVA

Hiroyuki Kondo, Takashi Aoki, Yoshio Gomei, 2005, SPIE Advanced Lithography.

A reflectance measurement system for investigating radiation damage to EUVL mirrors in NewSUBARU

Hiroyuki Kondo, Masahito Niibe, Takashi Aoki, 2004, SPIE Optics + Photonics.

Shearing interferometry for at wavelength wavefront measurement of extreme-ultraviolet lithography projection optics

Kazuya Ota, Masanobu Hasegawa, Akiyoshi Suzuki, 2003 .

Development progress of optics for extreme ultraviolet lithography at Nikon

Hiroyuki Kondo, Hiroshi Chiba, Katsuhiko Murakami, 2009 .

Development of projection optics set-3 for high-numerical-aperture extreme ultraviolet exposure tool (HiNA)

Iwao Nishiyama, Hiroaki Oizumi, Shinji Okazaki, 2004 .

Study of Transmittance of Polymers and Influence of Photoacid Generator on Resist Transmittance at Extreme Ultraviolet Wavelength

Masaru Sasago, Masayuki Endo, Hiroyuki Kondo, 2002 .

Measurement of resist transmittance at extreme ultraviolet wavelength using the extreme ultraviolet reflectometer

Masaru Sasago, Masayuki Endo, Hiroyuki Kondo, 2002 .

Wave-front errors of reference spherical waves in high-numerical aperture point diffraction interferometers

Kazuya Ota, Masanobu Hasegawa, Akiyoshi Suzuki, 2004 .