Marylyn H. Bennett

Image paradigm for semiconductor defect data reduction

Kenneth W. Tobin, Thomas P. Karnowski, Hamed Sari-Sarraf, 1996, Advanced Lithography.

Toward traceability for at-line AFM dimensional metrology

Michael T. Postek, Theodore V. Vorburger, Ronald G. Dixson, 2002, SPIE Advanced Lithography.

CD reference materials for sub-10th μm applications

Richard A. Allen, Michael W. Cresswell, Loren W. Linholm, 2002, SPIE Advanced Lithography.

Semiwafer metrology project

Bhanwar Singh, Don E. Yansen, Lynda C. Hannemann-Mantalas, 1991, Other Conferences.

Quantitative profile-shape measurement study on a CD-SEM with application to etch-bias control

Benjamin D. Bunday, John R. Swyers, Michael Bishop, 2002, SPIE Advanced Lithography.

Stepper Lens Characterization Using A Field Emission SEM

Jack Smith, Jim Pollard, Mike Tipton, 1988, Advanced Lithography.