Hisako Ishikawa

Development of a novel closed EUV pellicle for EUVL manufacturing

Yosuke Ono, Kazuo Kohmura, Atsushi Okubo, 2016, Photomask Technology.

Development of closed-type EUV pellicle

Yosuke Ono, Kazuo Kohmura, Atsushi Okubo, 2018, Photomask Japan.

Development of EUV pellicle for suppression of contamination, haze, and outgas generation

Yosuke Ono, Kazuo Kohmura, Atsushi Okubo, 2017, Photomask Technology.