Grant M. Kloster

Aerial image improvements on the Intel MET

Yashesh Shroff, Todd R. Younkin, Terence Bacuita, 2010, Advanced Lithography.

Printability of extreme ultraviolet lithography mask pattern defects for 22-40 nm half-pitch features

Ted Liang, Todd R. Younkin, Roman Caudillo, 2010, Advanced Lithography.

Correlation of Surface and Film Chemistry with Mechanical Properties in Interconnects

Chih-I Wu, Grant M. Kloster, Jihperng Leu, 2003 .

EUV Resist Testing Status and Post Lithography LWR Reduction

Manish Chandhok, Todd R. Younkin, E. Steve Putna, 2011 .

Porosity effects on low-k dielectric film strength and interfacial adhesion

Grant M. Kloster, T. Scherban, Ying Zhou, 2002, Proceedings of the IEEE 2002 International Interconnect Technology Conference (Cat. No.02EX519).