Dmitrijs Opalevs

A narrow-band continuous-wave laser source at 191 nm

Patrick Leisching, Matthias Scholz, Wilhelm Kaenders, 2013, Photonics West - Lasers and Applications in Science and Engineering.

Enabling proximity mask-aligner lithography with a 193nm CW light source

Patrick Leisching, Toralf Scharf, Wilfried Noell, 2018, Advanced Lithography.

Mask-aligner Talbot lithography using a 193nm CW light source

Patrick Leisching, Toralf Scharf, Wilfried Noell, 2018, Advanced Lithography.

CW emission at 193 nm using an all solid-state laser source

Patrick Leisching, Matthias Scholz, Wilhelm Kaenders, 2014, Photonics West - Lasers and Applications in Science and Engineering.

Quality control of AR/VR near-eye displays: goniometric vs. advanced 2D imaging light measurements

Ferdinand Deger, Tobias Steinel, Dmitrijs Opalevs, 2021, AR, VR, MR.

A bright continuous-wave laser source at 193 nm

Patrick Leisching, Guiling Wang, Matthias Scholz, 2013 .

1.3-mW tunable and narrow-band continuous-wave light source at 191 nm.

Patrick Leisching, Guiling Wang, Matthias Scholz, 2012, Optics express.