R. Nakata

New Method to Predict Common Mode, Differential Mode and Total Conducted Emission for LED Lighting Implement (特集 The 20th MAGDA Conference in Pacific Asia (MAGDA2011))

Katsuhiro Hirata, Yoshihiko Namba, K. Tsujimoto, 2012 .

The application of simultaneous ebeam cure methods for 65 nm node Cu/low-k technology with hybrid (PAE/MSX) structure

R. Nakata, T. Yoda, H. Miyajima, 2004, Proceedings of the IEEE 2004 International Interconnect Technology Conference (IEEE Cat. No.04TH8729).

Challenge of low-k materials for 130, 90, 65 nm node interconnect technology and beyond

H. Shibata, H. Kamijo, N. Nakamura, 2004, IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004..