Makiko Irie

Resist development to improve flare issue of EUV lithography

Takeyoshi Mimura, Takeshi Iwai, Takako Suzuki, 2008, SPIE Advanced Lithography.

Changes of chemical nature of photoresists induced by various plasma treatments and their impact on LWR

Hiroichi Kawahira, Masashi Yoshida, Nobuyuki Matsuzawa, 2006, SPIE Advanced Lithography.

Fundamental Studies on the Acid Generator to Improve the Resolution, Line Width Roughness, and Sensitivity Tradeoff under Ionizing Radiation

Kensuke Matsuzawa, Yoshitaka Komuro, Yoshiyuki Utsumi, 2010 .

Surface Property Control for 193nm Immersion Resist

Takeshi Iwai, Makiko Irie, Kotaro Endo, 2006 .