Ali Madouri

Exploration of the ultimate patterning potential achievable with focused ion beams.

Jacques Gierak, Eric Bourhis, L. Bruchhaus, 2005, Ultramicroscopy.

Focused ion beam sculpted membranes for nanoscience tooling

Gilles Patriarche, Xavier Lafosse, Jacques Gierak, 2006 .

A 100‐nm patterned x‐ray mask technology based on amorphous SiC membranes

Franck Carcenac, Dominique Decanini, Anne-Marie Haghiri-Gosnet, 1990 .

Sub-5nm FIB direct patterning of nanodevices

Gilles Patriarche, Xavier Lafosse, Jacques Gierak, 2007 .