Mike Wagner

Understanding EUV resist mottling leading to better resolution and linewidth roughness

James Cameron, Paul LaBeaume, Suzanne Coley, 2014, Advanced Lithography.

Progress in resolution, sensitivity, and critical dimensional uniformity of EUV chemically amplified resists

James Cameron, Paul LaBeaume, Suzanne Coley, 2013, Advanced Lithography.

Understanding the Role of Acid vs. Electron Blur in EUV Resist Materials

James W. Thackeray, John J. Biafore, Mike Wagner, 2010 .

Optimization of Polymer-bound PAG (PBP) for 20nm EUV Lithography

James W. Thackeray, James F. Cameron, Su-Jin Kang, 2011 .