Holger Glatzel

Projection optics for EUVL micro-field exposure tools with 0.5 NA

Regina Soufli, Michael Goldstein, Patrick Naulleau, 2014, Advanced Lithography.

Update on the SEMATECH 0.5 NA Extreme-Ultraviolet Lithography (EUVL) Microfield Exposure Tool (MET)

Dominic Ashworth, Regina Soufli, Michael Goldstein, 2014, Advanced Lithography.

Successful production of the engineering development unit (EDU) primary mirror segment and flight unit tertiary mirror for JWST

Patrick Johnson, Lee Dettmann, Allen Lee, 2010, Astronomical Telescopes + Instrumentation.

JWST mirror production status

Koby Smith, Patrick Johnson, Scott Texter, 2011, Optical Engineering + Applications.

Projection optics for extreme ultraviolet lithography (EUVL) micro-field exposure tools (METs) with a numerical aperture of 0.5

Dominic Ashworth, Regina Soufli, Michael Goldstein, 2013, Advanced Lithography.