Qiongyan Yuan

A novel method for measuring the coma aberration of lithographic projection optics by relative image displacements at multiple illumination settings

Xiangzhao Wang, Fan Wang, Mingying Ma, 2007, SPIE/COS Photonics Asia.

Aberration-induced intensity imbalance of alternating phase-shifting mask in lithographic imaging.

Qiongyan Yuan, Zicheng Qiu, Xiangzhao Wang, 2010, Optics letters.

Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations.

Lifeng Duan, Qiongyan Yuan, Zicheng Qiu, 2009, Applied optics.

Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width.

Fan Wang, Qiongyan Yuan, Zicheng Qiu, 2009, Applied optics.

Coma measurement of projection optics in lithographic tools based on relative image displacements at multiple illumination settings.

Mingying Ma, Fan Wang, Qiongyan Yuan, 2007, Optics express.

Measurement technique for characterizing odd aberration of lithographic projection optics based on dipole illumination

Qiongyan Yuan, Zicheng Qiu, Xiangzhao Wang, 2010 .

Trefoil aberration measurement of lithographic projection optics based on linewidth asymmetry of the aerial image

Qiongyan Yuan, Zicheng Qiu, Xiangzhao Wang, 2010 .