J. Vertommen

发表

Top-surface imaging and optical proximity correction: a way to 0.18-um lithography at 248 nm

Frieda Van Roey, Anne-Marie Goethals, Kurt G. Ronse, 1996, Advanced Lithography.

Scaling of high-k dielectrics towards sub-1nm EOT

S. De Gendt, D. Pique, S. Van Elshocht, 2003, 2003 International Symposium on VLSI Technology, Systems and Applications. Proceedings of Technical Papers. (IEEE Cat. No.03TH8672).